Nanoscience has become an extremely popular field, where many researchers from different disciplines combine their talents and efforts. In many projects, the ability to pattern surfaces at very small (sub-100 nm) lengthscales, and to control the chemical and physical properties of surfaces at this level, is crucial. However, many lithographic techniques do not inherently allow control over the surface chemistry. Nanotechnology has a strong record in reporting breakthroughs in lithographic methods as well as physical studies of nanostructured surfaces.

In this special issue, we aim to bring together a number of authors who are leaders in the field of modifying surfaces using chemical techniques and utilizing surface chemistry to build (pseudo-)3D structures. A range of so-called soft-lithographic techniques, relying on self-assembly, self-organization, polymer chemistry, and chemical bond formation, will be introduced in this issue. We hope that an overview of the stunning progress of these methods will act as an eye-opener to many other researchers, who might be able to use some of these ideas in their projects.