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Microscopic and optical investigation of Ge nanoislands on silicon substrates

Z F Krasil'nik1, P Lytvyn2, D N Lobanov1, N Mestres3, A V Novikov1, J Pascual4, M Ya Valakh2 and V A Yukhymchuk2

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We investigate self-assembled nanoislands in heteroepitaxial GeSi systems by means of atomic force microscopy and micro-Raman scattering techniques. We show that the surface diffusion of Si atoms from the substrate to the islands is strongly enhanced when the temperature increases, giving rise to a wider stability range of pyramid-shaped volumes.


PACS

68.55.A- Nucleation and growth

68.55.-a Thin film structure and morphology

68.37.Ps Atomic force microscopy (AFM)

68.35.Fx Diffusion; interface formation

78.30.Am Elemental semiconductors and insulators

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 1 (February 2002)

Received 11 May 2001, in final form 27 September 2001

Published 18 January 2002



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