Onejae Sul et al 2009 Meas. Sci. Technol. 20 115104 doi:10.1088/0957-0233/20/11/115104
Onejae Sul, Seongjin Jang and Eui-Hyeok Yang
Show affiliationsA novel calibration technique has been developed for lateral force microscopy (LFM). Typically, special preparation of the atomic force microscope (AFM) cantilever or a substrate is required for LFM calibration. The new calibration technique reported in this paper greatly reduces the required preparation processes by simply scanning over a rigid step and measuring the response of the AFM photodiode in the normal and lateral directions. When an AFM tip touches a step while scanning, the tip experiences a reaction force from the step edge, and the amount of torsion can be estimated based on the ratio of the normal and torsional spring constants of an AFM cantilever. Therefore, the torsion can be calibrated using the measured response of the photodiode from the lateral movement of the AFM tip. This new calibration technique has been tested and confirmed by measuring Young's modulus of a nickel (Ni) nanowire.
06.20.fb Standards and calibration
62.25.-g Mechanical properties of nanoscale systems
07.79.Lh Atomic force microscopes
85.60.Dw Photodiodes; phototransistors; photoresistors
81.40.Jj Elasticity and anelasticity, stress-strain relations
Instrumentation and measurement
Surfaces, interfaces and thin films
Optics, quantum optics and lasers
Issue 11 (November 2009)
Received 10 August 2009, in final form 26 August 2009
Published 25 September 2009
Onejae Sul et al 2009 Meas. Sci. Technol. 20 115104
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