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Random sequential adsorption: from continuum to lattice and pre-patterned substrates

A Cadilhe1, N A M Araújo1 and Vladimir Privman2

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The random sequential adsorption (RSA) model has served as a paradigm for diverse phenomena in physical chemistry, as well as in other areas such as biology, ecology, and sociology. In the present work, we survey aspects of the RSA model with emphasis on the approach to and properties of jammed states obtained for large times in continuum deposition versus that on lattice substrates, and on pre-patterned surfaces. The latter model has been of recent interest in the context of efforts to use pre-patterning as a tool to improve self-assembly in micro- and nanoscale surface structure engineering.


PACS

68.43.-h Chemisorption/physisorption: adsorbates on surfaces

68.35.B- Structure of clean surfaces (and surface reconstruction)

81.16.Dn Self-assembly

Subjects

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 6 (14 February 2007)

Received 22 October 2006

Published 22 January 2007



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