J Feng et al 2005 J. Phys.: Condens. Matter 17 S1339 doi:10.1088/0953-8984/17/16/005
J Feng1, E Forest2, A A MacDowell1, M Marcus1, H Padmore1, S Raoux3, D Robin1, A Scholl1, R Schlueter1, P Schmid1, J Stöhr4, W Wan1, D H Wei5 and Y Wu6
Show affiliationsA new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed at the advanced light source (ALS). An electron mirror combined with a sophisticated magnetic beam separator is used to provide simultaneous correction of spherical and chromatic aberrations. Installed on an elliptically polarized undulator beamline, PEEM3 will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials.
68.37.Xy Scanning Auger microscopy, photoelectron microscopy
Accelerators, beams and electromagnetism
Issue 16 (27 April 2005)
Received 9 December 2004, in final form 9 December 2004
Published 8 April 2005
J Feng et al 2005 J. Phys.: Condens. Matter 17 S1339
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