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An x-ray photoemission electron microscope using an electron mirror aberration corrector for the study of complex materials

J Feng1, E Forest2, A A MacDowell1, M Marcus1, H Padmore1, S Raoux3, D Robin1, A Scholl1, R Schlueter1, P Schmid1, J Stöhr4, W Wan1, D H Wei5 and Y Wu6

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A new ultrahigh-resolution photoemission electron microscope called PEEM3 is being developed at the advanced light source (ALS). An electron mirror combined with a sophisticated magnetic beam separator is used to provide simultaneous correction of spherical and chromatic aberrations. Installed on an elliptically polarized undulator beamline, PEEM3 will be operated with very high spatial resolution and high flux to study the composition, structure, electric and magnetic properties of complex materials.


PACS

68.37.Xy Scanning Auger microscopy, photoelectron microscopy

41.85.Gy Chromatic and geometrical aberrations

Subjects

Accelerators, beams and electromagnetism

Surfaces, interfaces and thin films

Optics, quantum optics and lasers

Dates

Issue 16 (27 April 2005)

Received 9 December 2004, in final form 9 December 2004

Published 8 April 2005



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