E Di Fabrizio et al 2004 J. Phys.: Condens. Matter 16 S3517 doi:10.1088/0953-8984/16/33/013
E Di Fabrizio1, R Fillipo1, S Cabrini1, R Kumar1,4, F Perennes2, M Altissimo1, L Businaro1, D Cojac3, L Vaccari1, M Prasciolu1 and P Candeloro1
Show affiliationsELETTRA (http://www.elettra.trieste.it/index.html) is a third generation synchrotron radiation source facility operating at Trieste, Italy, and hosts a wide range of research activities in advanced materials analysis and processing, biology and nano-science at several various beam lines. The energy spectrum of ELETTRA allows x-ray nano-lithography using soft (1.5 keV) and hard x-ray (10 keV) wavelengths. The Laboratory for Interdisciplinary Lithography (LIILIT) was established in 1998 as part of an Italian national initiative on micro- and nano-technology project of INFM and is funded and supported by the Italian National Research Council (CNR), INFM and ELETTRA. LILIT had developed two dedicated lithographic beam lines for soft (1.5 keV) and hard x-ray (10 keV) for micro- and nano-fabrication activities for their applications in engineering, science and bio-medical applications. In this paper, we present a summary of our research activities in micro- and nano-fabrication involving x-ray nanolithography at LILIT's soft and hard x-ray beam lines.
Issue 33 (25 August 2004)
Received 6 May 2004
Published 6 August 2004
E Di Fabrizio et al 2004 J. Phys.: Condens. Matter 16 S3517
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