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Voltage control of exchange coupling in phosphorus doped silicon

C J Wellard1, L C L Hollenberg1, L M Kettle2 and H-S Goan3

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Motivated by applications to quantum computer architectures we study the change in the exchange interaction between neighbouring phosphorus donor electrons in silicon due to the application of voltage biases to surface control electrodes. These voltage biases create electro-static fields within the crystal substrate, perturbing the states of the donor electrons and thus altering the strength of the exchange interaction between them. We find that control gates of this kind can be used to either enhance or reduce the strength of the interaction, by an amount that depends both on the magnitude and orientation of the donor separation.


PACS

61.72.uf Ge and Si

85.30.-z Semiconductor devices

71.70.Gm Exchange interactions

Subjects

Condensed matter: electrical, magnetic and optical

Electronics and devices

Semiconductors

Condensed matter: structural, mechanical & thermal

Dates

Issue 32 (18 August 2004)

Received 13 May 2004

Published 30 July 2004



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