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Interactions of point defects with dislocations in n-type silicon-doped GaAs

H Lei1,4, H S Leipner1,4, N Engler2 and J Schreiber3

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Raman scattering and cathodoluminescence experiments have been performed to investigate the effect of dislocations on the spatial distribution of point defects and on the free electron concentration in n-type GaAs:Si. An experimentally extended increase of the free electron and (SiGaVGa)2− complex concentrations from the matrix to the dislocation is explained as resulting from the formation of arsenic precipitates around the dislocation by means of computer simulations based on a diffusion–aggregation model.


PACS

61.72.Yx Interaction between different crystal defects; gettering effect

78.30.Fs III-V and II-VI semiconductors

78.60.Hk Cathodoluminescence, ionoluminescence

61.72.Bb Theories and models of crystal defects

61.72.J- Point defects and defect clusters

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Condensed matter: structural, mechanical & thermal

Dates

Issue 34 (2 September 2002)

Received 15 May 2002, in final form 18 June 2002

Published 15 August 2002



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