Quick search Find article
Quick search
Find article

Interactions of point defects with dislocations in n-type silicon-doped GaAs

H Lei1,4, H S Leipner1,4, N Engler2 and J Schreiber3

Show affiliations


Raman scattering and cathodoluminescence experiments have been performed to investigate the effect of dislocations on the spatial distribution of point defects and on the free electron concentration in n-type GaAs:Si. An experimentally extended increase of the free electron and (SiGaVGa)2− complex concentrations from the matrix to the dislocation is explained as resulting from the formation of arsenic precipitates around the dislocation by means of computer simulations based on a diffusion–aggregation model.


PACS

61.72.Yx Interaction between different crystal defects; gettering effect

78.30.Fs III-V and II-VI semiconductors

78.60.Hk Cathodoluminescence, ionoluminescence

61.72.Bb Theories and models of crystal defects

61.72.J- Point defects and defect clusters

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Condensed matter: structural, mechanical & thermal

Dates

Issue 34 (2 September 2002)

Received 15 May 2002, in final form 18 June 2002

Published 15 August 2002



View by subject




Export








Please login to access our web services, or create an account if you don't yet have one.

You must have cookies enabled in your web browser to be able to login.

Username
Password

Forgotten your password? Get a new one here.