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A high critical current density MOCVD coated conductor with strong vortex pinning centers suitable for very high field use

Z Chen1, F Kametani1, Y Chen2, Y Xie2, V Selvamanickam2 and D C Larbalestier1

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We have made extensive low temperature and high field evaluations of a recent 2.1 µm thick coated conductor (CC) grown by metal–organic chemical vapor deposition (MOCVD) with a view to its use for high field magnet applications, for which its very strong Hastelloy substrate makes it very suitable. This conductor contains dense three-dimensional (Y,Sm)2O3 nanoprecipitates, which are self-aligned in planes tilted ~7° from the tape plane. Very strong vortex pinning is evidenced by high critical current density Jc values of ~3.1 MA cm−2 at 77 K and ~43 MA cm−2 at 4.2 K, and by a strongly enhanced irreversibility field Hirr, which reaches that of Nb3Sn (~28 T at 1.5 K) at 60 K, even in the inferior direction of H\parallel {c}  axis. At 4.2 K, Jc values are ~15% of the depairing current density Jd, much the highest of any superconductor suitable for magnet construction.


PACS

74.25.Sv Critical currents

74.78.Bz High-Tc films

81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

74.72.Bk Y-based cuprates

74.25.Qt Vortex lattices, flux pinning, flux creep

Subjects

Superconductivity

Surfaces, interfaces and thin films

Dates

Issue 5 (May 2009)

Received 2 December 2008, in final form 5 March 2009

Published 7 April 2009



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