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Cross-sectional scanning tunnelling microscopy of III-V semiconductor structures

REVIEW ARTICLE

R M Feenstra

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The method of cross-sectional scanning tunnelling microscopy (STM) is described. Illustrative examples are given of studies of III-V semiconductor systems, including AlxGa1-xAs/GaAs superlattices, InAs/GaSb superlattices and low-temperature-grown GaAs. Physical properties studied include alloy clustering, interface roughness, band offsets, quantum subbands and point defects. In each case, STM permits the observation of structural features on an atomic scale. The associated electronic spectroscopy for states a few eV on either side of the Fermi level can be determined. Such information is relevant for the operation of devices constructed from these layered semiconductor systems.


PACS

68.37.Ef Scanning tunneling microscopy (including chemistry induced with STM)

73.20.At Surface states, band structure, electron density of states

68.35.Dv Composition, segregation; defects and impurities

73.40.Kp III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions

68.35.Ct Interface structure and roughness

Subjects

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 12 (December 1994)



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