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Lateral quantum dots in Si/SiGe realized by a Schottky split-gate technique

T Berer, D Pachinger, G Pillwein, M Mühlberger, H Lichtenberger, G Brunthaler and F Schäffler

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A Schottky split gate technique is used to form lateral quantum dots in the two-dimensional electron gases of a high-mobility Si/SiGe heterostructure. e-beam defined palladium gates show Schottky barriers with very well controlled leakage currents. At low temperatures we observe Coulomb-blockade and stability diamonds on lateral quantum dots containing less than 25 electrons. The experiments demonstrate that, in contrast to recent reports, Schottky gates are a feasible approach for the fabrication and integration of single electron transistors in the strained Si/SiGe heterostructure.


PACS

85.35.Gv Single electron devices

73.40.Kp III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions

03.67.Lx Quantum computation architectures and implementations

73.63.Kv Quantum dots

85.35.Be Quantum well devices (quantum dots, quantum wires, etc.)

73.30.+y Surface double layers, Schottky barriers, and work functions

Subjects

Computational physics

Electronics and devices

Semiconductors

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Quantum information and quantum mechanics

Dates

Issue 1 (January 2007)

Received 11 May 2006, in final form 25 August 2006

Published 5 December 2006



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