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Energy relaxation by hot 2D electrons in AlGaN/GaN heterostructures: the influence of strong impurity and defect scattering

C E Martinez1, N M Stanton1, A J Kent1, M L Williams2, I Harrison2, H Tang3, J B Webb3 and J A Bardwell3

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We report measurements of the energy loss rates and scattering times for two-dimensional electrons in a series of AlGaN/GaN heterostructures grown on different substrate materials. It was found that the device grown on a substrate having the largest lattice mismatch to GaN was within the dirty limit where strong carrier scattering gives rise to an enhanced energy loss rate, which is proportional to T4e at low electron temperatures, Te < 10 K. This is consistent with the measurements of the scattering times and shows that strong scattering by impurities and defects can play an important role in the energy relaxation of some GaN-based devices at low temperatures.


PACS

72.20.Ht High-field and nonlinear effects

72.10.Fk Scattering by point defects, dislocations, surfaces, and other imperfections (including Kondo effect)

73.40.Kp III-V semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 12 (December 2006)

Received 15 June 2006, in final form 4 September 2006

Published 29 September 2006



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