Lu Zhong-Lin et al 2009 Chinese Phys. Lett. 26 116102 doi:10.1088/0256-307X/26/11/116102
Lu Zhong-Lin1,2,3, Zou Wen-Qin3, Xu Ming-Xiang1, Zhang Feng-Ming3 and Du You-Wei3
Show affiliationsHigh-quality Ga-doped ZnO (ZnO:Ga) single crystalline films with various Ga concentrations are grown on a-plane sapphire substrates using molecular-beam epitaxy. The site configuration of doped Ga atoms is studied by means of x-ray absorption spectroscopy. It is found that nearly all Ga can substitute into ZnO lattice as electrically active donors, a generating high density of free carriers with about one electron per Ga dopant when the Ga concentration is no more than 2%. However, further increasing the Ga doping concentration leads to a decrease of the conductivity due to partial segregation of Ga atoms to the minor phase of the spinel ZnGa2O4 or other intermediate phase. It seems that the maximum solubility of Ga in the ZnO single crystalline film is about 2 at.% and the lowest resistivity can reach 1.92 × 10−4 Ω
cm at room temperature, close to the best value reported. In contrast to ZnO:Ga thin film with 1% or 2% Ga doping, the film with 4% Ga doping exhibits a metal semiconductor transition at 80 K. The scattering mechanism of conducting electrons in single crystalline ZnO:Ga thin film is discussed.
68.55.-a Thin film structure and morphology
78.70.Dm X-ray absorption spectra
68.55.A- Nucleation and growth
81.15.Hi Molecular, atomic, ion, and chemical beam epitaxy
68.55.Ln Defects and impurities: doping, implantation, distribution, concentration, etc.
Issue 11 (November 2009)
Received 5 August 2009
Lu Zhong-Lin et al 2009 Chinese Phys. Lett. 26 116102
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