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Low Density Self-Assembled InAs/GaAs Quantum Dots Grown by Metal Organic Chemical Vapour Deposition

Li Lin1, Liu Guo-Jun1, Wang Xiao-Hua1, Li Mei1, Li Zhan-Guo1 and Wan Chun-Ming1

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The self-assembled InAs quantum dots (QDs) on GaAs substrates with low density (5 × 108 cm−2) are achieved using relatively higher growth temperature and low InAs coverage by low-pressure metal-organic chemical vapour deposition. The macro-PL spectra exhibit three emission peaks at 1361, 1280 and 1204 nm, corresponding to the ground level (GS), the first excited state (ES1) and the second excited state (ES2) of the QDs, respectively, which are obtained when the GaAs capping layer is grown using triethylgallium and tertiallybutylarsine. As a result of micro-PL, only a few peaks from individual dots have been observed. The exciton-biexciton behaviour was clearly observed at low temperature.


PACS

81.16.Be Chemical synthesis methods

81.07.Ta Quantum dots

81.16.Dn Self-assembly

78.67.Hc Quantum dots

78.55.Cr III-V semiconductors

81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 2 (February 2008)

Received 27 April 2007



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