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Growth and Characterization of Cu2O Films Made by Rapid Thermal Oxidation Technique

Raid A. Ismail1, Ibrahim Ramadhan2 and Aseel Mustafa2

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Cu2O thin films with (111) preferred orientation have been grown on glass and Cu substrates by rapid thermal oxidation of Cu at 500°C for 45 s. The optical band gap energy was determined by spectral data of transmittance and absorbance to be 2.04 eV. The electrical conductivity of grown films was measured around (1.1×10−5Ω−1cm−1) at 300 K. Thermoelectric power measurements of the film were carried out. Furthermore, the properties of these films are compared with properties of Cu2O obtained by other methods.


PACS

73.61.Le Other inorganic semiconductors

71.20.Nr Semiconductor compounds

68.55.A- Nucleation and growth

73.50.Lw Thermoelectric effects

78.66.Li Other semiconductors

73.50.Pz Photoconduction and photovoltaic effects

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 11 (November 2005)

Received 19 July 2005



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