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Near fields in nanostructures

REVIEW ARTICLE

Christian Girard

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Recent progress in near-field optics instrumentation has led to a new class of subwavelength optical experiments in which near-field optical microscopes are used to image precisely the electromagnetic field distributions inside nanostructures microfabricated at the surface of dielectric wafers (microwaveguides, optical splitters, whispering-gallery modes, three-dimensional photonic crystals, metal nanoparticle gratings, plasmon waveguides, etc). In the light of these new advances, we review the physics of near-field optics in the presence of nanostructured materials (the so-called nano-optics). After the introductory part, revealing the main theoretical schemes and computation techniques well-suited for nano-optics, we will focus on several typical examples of calculations extracted from the recent literature. We will begin this series by revisiting the challenging problem of the optical addressing of both passive or active nanostructures in a subwavelength area. In this context, various procedures for the optimization of the energy transfer efficiency inside addressed nanostructures will be detailed. Finally, the concept of photonic local density of states in near-field optics will be revisited.


PACS

68.37.Uv Near-field scanning microscopy and spectroscopy

42.82.Cr Fabrication techniques; lithography, pattern transfer

07.79.Fc Near-field scanning optical microscopes

81.16.Nd Nanolithography

Subjects

Instrumentation and measurement

Surfaces, interfaces and thin films

Optics, quantum optics and lasers

Nanoscale science and low-D systems

Dates

Issue 8 (August 2005)

Received 13 April 2005, in final form 13 June 2005

Published 11 July 2005



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