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Theory of semiconductor surface reconstruction

REVIEW ARTICLE

G P Srivastava

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We present a review of semiconductor surface reconstruction. Experimental and theoretical results on atomic geometry, electronic states, phonon modes, and bonding are presented for clean cleaved, clean epitaxially grown, overlayer covered, surfactant mediated epitaxially grown, and defect induced reconstructed semiconductor surfaces. Energetic aspects of reconstructions are discussed using empirical as well as first-principles theoretical approaches.


PACS

68.35.B- Structure of clean surfaces (and surface reconstruction)

68.43.Fg Adsorbate structure (binding sites, geometry)

68.35.Ja Surface and interface dynamics and vibrations

71.15.Ap Basis sets (LCAO, plane-wave, APW, etc.) and related methodology (scattering methods, ASA, linearized methods, etc.)

68.47.Fg Semiconductor surfaces

68.35.Dv Composition, segregation; defects and impurities

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 5 (May 1997)

Received 12 November 1996, in final form 28 January 1997



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