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Accurate determination of the surface normal for the reliable measurement of ultra-thin SiO2 thickness by x-ray photoelectron spectroscopy

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Kyung Joong Kim1, Jong Shik Jang and Dae Won Moon

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[1]

Angular accuracy and the comparison of two methods for determining the surface normal in a Kratos Axis Ultra X-ray photoelectron spectrometer

M. P. Seah and S. J. Spencer  Surface and Interface Analysis 2009  n/a
CrossRef 
[2]

A mutual calibration method to certify the thickness of nanometre oxide films

Kyung Joong Kim et al  Metrologia 2008  45 507
IOPscience 
[3]

Comparison of the accuracies of two methods for the determination of the surface normal for x-ray photoelectron spectroscopy

M P Seah  Metrologia 2007  44 242
IOPscience 
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