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The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux

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J Schulze, E Schüngel and U Czarnetzki

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Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring

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Coupling effects in inductive discharges with radio frequency substrate biasing

J. Schulze et al  Applied Physics Letters 2012  100 024102
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Making a geometrically asymmetric capacitive rf discharge electrically symmetric

Julian Schulze et al  Applied Physics Letters 2011  98 031501
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Power absorption in electrically asymmetric dual frequency capacitive radio frequency discharges

E. Schüngel et al  Physics of Plasmas 2011  18 013503
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Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge

Quan-Zhi Zhang et al  Journal of Applied Physics 2011  109 013308
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Ionization by Drift and Ambipolar Electric Fields in Electronegative Capacitive Radio Frequency Plasmas

J. Schulze et al  Physical Review Letters 2011  107 275001
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Particle Simulations of Sheath Dynamics in Low-Pressure Capacitively Coupled Argon Plasma Discharges

Yoshinori Takao et al  Japanese Journal of Applied Physics 2011  50 08JC02
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Control of Nanocrystalline Silicon Growth Phase and Deposition Rate through Voltage Waveform Tailoring during PECVD

E.V. Johnson et al  MRS Proceedings 2011  1339 mrss11-1339-s04-05
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Influence of dual-frequency source powers on ion density and electron temperature in capacitively-coupled argon plasma

Xiang-Zhan Jiang et al  Vacuum 2011 
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[10]

Electron heating and the electrical asymmetry effect in dual-frequency capacitive CF4 discharges

J Schulze et al  Plasma Sources Science and Technology 2011  20 045008
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[11]

Secondary electrons in dual-frequency capacitive radio frequency discharges

J Schulze et al  Plasma Sources Science and Technology 2011  20 045007
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[12]

The electrical asymmetry effect in capacitively coupled radio-frequency discharges

U Czarnetzki et al  Plasma Sources Science and Technology 2011  20 024010
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[13]

The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges

J Schulze et al  Plasma Sources Science and Technology 2011  20 015017
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[14]

Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect

E Schüngel et al  Journal of Physics D: Applied Physics 2011  44 285205
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[15]

The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges

Z. Donkó et al  Applied Physics Letters 2010  97 081501
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[16]

The influence of the relative phase between the driving voltages on electron heating in asymmetric dual frequency capacitive discharges

D Ziegler et al  Plasma Sources Science and Technology 2010  19 045001
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[17]

Excitation dynamics in electrically asymmetric capacitively coupled radio frequency discharges: experiment, simulation, and model

J Schulze et al  Plasma Sources Science and Technology 2010  19 045028
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[18]

Nanocrystalline silicon film growth morphology control through RF waveform tailoring

Erik V Johnson et al  Journal of Physics D: Applied Physics 2010  43 412001
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[19]

Charge dynamics in capacitively coupled radio frequency discharges

J Schulze et al  Journal of Physics D: Applied Physics 2010  43 225201
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[20]

Phase resolved optical emission spectroscopy: a non-intrusive diagnostic to study electron dynamics in capacitive radio frequency discharges

J Schulze et al  Journal of Physics D: Applied Physics 2010  43 124016
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[21]

Mass spectrometry study of positive and negative ions in a capacitively coupled atmospheric pressure RF excited glow discharge in He–water mixtures

Peter Bruggeman et al  Journal of Physics D: Applied Physics 2010  43 012003
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[22]

Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model

J. Schulze et al  Journal of Applied Physics 2009  106 063307
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