M Meyyappan 2009 J. Phys. D: Appl. Phys. 42 213001 doi:10.1088/0022-3727/42/21/213001
M Meyyappan
Show affiliationsPlasma enhanced chemical vapour deposition (PECVD) has been widely discussed in the literature for the growth of carbon nanotubes (CNTs) and carbon nanofibres (CNFs) in recent years. Advantages claimed include lower growth temperatures relative to thermal CVD and the ability to grow individual, free-standing, vertical CNFs instead of tower-like structures or ensembles. This paper reviews the current status of the technology including equipment, plasma chemistry, diagnostics and modelling, and mechanisms. Recent accomplishments include PECVD of single-walled CNTs and growth at low temperatures for handling delicate substrates such as glass.
81.16.-c Methods of nanofabrication and processing
81.15.Gh Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)
Issue 21 (7 November 2009)
Received 12 May 2009, in final form 26 August 2009
Published 6 October 2009
M Meyyappan 2009 J. Phys. D: Appl. Phys. 42 213001
Herschel Rabitz 2009 New J. Phys. 11 105030
J Mark Heinzle and Hans Ringström 2009 Class. Quantum Grav. 26 145001
Fabrizio Colombo 2009 Inverse Problems 25 105007
J C Phillips 2007 J. Phys.: Condens. Matter 19 455213
Jian Ye et al 2009 J. Phys.: Conf. Ser. 190 012105
Min-Seok Park et al 2007 J. Phys.: Condens. Matter 19 242201
I Korolov et al 2009 J. Phys.: Conf. Ser. 192 012018
Irina Rod et al 2009 Nanotechnology 20 335301
Dong-Ming Yeh et al 2008 Nanotechnology 19 345201