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Design and characterization of strained InGaAs/GaAsSb type-II 'W' quantum wells on InP substrates for mid-IR emission

J Y T Huang1, L J Mawst1, T F Kuech2, X Song3, S E Babcock3, C S Kim4, I Vurgaftman4, J R Meyer4 and A L Holmes Jr5

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InGaAs/GaAsSb type-II 'W' quantum wells (QWs) grown on InP substrates by metalorganic vapour phase epitaxy were investigated for potential emission wavelengths in the mid-infrared spectral region. Design studies using an 8-band k centerdot p Hamiltonian model indicate that emission wavelengths near 3 µm should be achievable without strain relaxation. Improved electron confinement can be achieved by adding higher-energy band gap alloys such as AlAsSb or GaInP around the type-II 'W' active region. Comparisons of the simulations with experiment indicate that photoluminescence (PL) spectra are consistent with a type-II band alignment. 4-period type-II 'W' In0.8Ga0.2As (~4.0 nm)/GaAs0.35Sb0.65 (~1.5 nm) QWs separated by InP (5 nm) or AlAs0.767Sb0.233 (1.5 nm) barrier layers, demonstrate room-temperature PL emission at ~2.1 µm


PACS

78.55.Cr III-V semiconductors

78.30.Fs III-V and II-VI semiconductors

73.20.At Surface states, band structure, electron density of states

78.67.De Quantum wells

81.15.Kk Vapor phase epitaxy; growth from vapor phase

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Nanoscale science and low-D systems

Dates

Issue 2 (21 January 2009)

Received 11 August 2008, in final form 22 October 2008

Published 18 December 2008



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