Quick search Find article
Quick search
Find article

Modelling of thermal plasmas for arc welding: the role of the shielding gas properties and of metal vapour

REVIEW ARTICLE

A B Murphy1,4, M Tanaka2, K Yamamoto2, S Tashiro2, T Sato3 and J J Lowke1

Show affiliations


REVIEW ARTICLE

The methods used to model thermal plasmas, including treatments of diffusion in arcs in gas mixtures, are reviewed. The influence of thermophysical properties on the parameters of tungsten–inert-gas (TIG) welding arcs, particularly those that affect the weld pool, is investigated using a two-dimensional model in which the arc, anode and cathode are included self-consistently. The effect of changing each of six thermophysical properties on the characteristics of an argon TIG arc is assessed. The influence of the product of specific heat and mass density is found to be particularly important in determining the arc constriction. By examining the influence of the different properties on the heat flux density, current density and shear stress at the anode, it is concluded that the weld pool depth can be increased by using shielding gases with high specific heat, thermal conductivity and viscosity. The effect of metal vapour on the arc and weld pool properties is assessed. The most important effect of the metal vapour is found to be the increased electrical conductivity at low temperatures, which leads to lower heat flux density and current density at the weld pool, implying a shallower weld pool.


PACS

52.77.Fv High-pressure, high-current plasmas (plasma spray, arc welding, etc.)

52.65.-y Plasma simulation

52.25.Fi Transport properties

52.25.Kn Thermodynamics of plasmas

Subjects

Plasma physics

Dates

Issue 19 (7 October 2009)

Received 20 April 2009, in final form 3 July 2009

Published 18 September 2009



Related review articles

What's this?
View review articles related to this research to gain an insight into the key trends in this subject area. Related review articles are selected based on PACS/MSC codes, and are no more than three years old.

  1. Modelling of diamond deposition microwave cavity generated plasmas
  2. The status of the database for plasma processing
  3. Review of profile and roughening simulation in microelectronics plasma etching
More

View by subject




Export








Please login to access our web services, or create an account if you don't yet have one.

You must have cookies enabled in your web browser to be able to login.

Username
Password

Forgotten your password? Get a new one here.