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Spectral control of emissions from tin doped targets for extreme ultraviolet lithography

S S Harilal1, B O'Shay1, M S Tillack1, Y Tao1, R Paguio2, A Nikroo2 and C A Back2

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We have investigated the unresolved transition array (UTA) emission around 13.5 nm from solid density tin and tin doped foam targets. Extreme ultraviolet (EUV) spectral measurements were made in the wavelength region 11–17 nm using a transmission grating spectrograph and the EUV in-band conversion efficiency was measured using an absolutely calibrated EUV calorimeter. The aim of this work was to optimize the UTA emission with the proper density of tin dopant in low-Z foam targets. The addition of tin as an impurity leads to a reduction in the plasma continuum and narrowing of the UTA compared with fully dense tin targets. Our studies indicate that the required percentage of tin for obtaining bright in-band spectral emission is less than 1%.


PACS

52.38.-r Laser-plasma interactions

52.50.Dg Plasma sources

52.70.Kz Optical (ultraviolet, visible, infrared) measurements

Subjects

Instrumentation and measurement

Plasma physics

Dates

Issue 3 (7 February 2006)

Received 7 September 2005, in final form 4 December 2005

Published 20 January 2006



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