Masayoshi Esashi and Takahito Ono 2005 J. Phys. D: Appl. Phys. 38 R223 doi:10.1088/0022-3727/38/13/R01
From MEMS to nanomachine
REVIEW ARTICLEMasayoshi Esashi and Takahito Ono
Show affiliationsTOPICAL REVIEW
Practically applicable microelectromechanical systems (MEMS) and nanomachines have been developed by applying dry processes. Deep reactive ion etching (RIE) of silicon and its applications to an electrostatically levitated rotational gyroscope, a fibre optic blood pressure sensor and in micro-actuated probes are described. High density electrical feedthrough in glass is made using deep RIE of glass and electroplating of metal. Multi-probe data storage system has been developed using the high density electrical feedthrough in glass. Chemical vapour deposition (CVD) of different materials have been developed for MEMS applications; trench-refill using SiO2 CVD, microstructures using Silicon carbide CVD for glass mold press and selective CVD of carbon nanotube for electron field emitter. Multi-column electron beam lithography system has been developed using the electron field emitter.
- PACS
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85.85.+j Micro- and nano-electromechanical systems (MEMS/NEMS) and devices
85.40.Hp Lithography, masks and pattern transfer
- Subjects
- Dates
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Issue 13 (7 July 2005)
Received 9 June 2004, in final form 30 March 2005
Published 17 June 2005
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From MEMS to nanomachine
Masayoshi Esashi and Takahito Ono 2005 J. Phys. D: Appl. Phys. 38 R223
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