Richard S Moss et al 2004 J. Phys. D: Appl. Phys. 37 2502 doi:10.1088/0022-3727/37/18/006
Richard S Moss1, J Gary Eden2 and Mark J Kushner2,3
Show affiliationsElectrical breakdown of cold (room temperature) metal-halide arc lamps typically occurs through the fill of a rare gas (at a pressure of tens of Torrs) and the vapour produced by the metal donor. Restarting a warm lamp is often made difficult by the high pressure of the metal and metal-halide vapours. To reliably start cold lamps with a minimum voltage and a minimum sputtering of the electrodes, and to restart warm lamps that have a high pressure of the metal and metal-halide vapours, auxiliary sources of ionization are often used. As a point of departure for the study of these processes, measurements of formative breakdown times were made in a cylindrical discharge tube resembling a compact polycrystalline alumina envelope metal-halide lamp. Breakdown times were measured for Ar/Xe gas mixtures at total pressures of 10–90 Torr and biases up to 2 kV applied to a 1.6 cm gap. The data provide a knowledge base for a companion computational investigation. We found that breakdown times generally decreased with small admixtures of Xe in Ar (5–15%) and increased with larger admixtures. We attribute these trends to the changing shape of the tail of the electron energy distribution.
52.80.Mg Arcs; sparks; lightning; atmospheric electricity
51.50.+v Electrical properties (ionization, breakdown, electron and ion mobility, etc.)
Issue 18 (21 September 2004)
Received 30 May 2004
Published 1 September 2004
Richard S Moss et al 2004 J. Phys. D: Appl. Phys. 37 2502
M J Davis et al 2001 J. Phys. B: At. Mol. Opt. Phys. 34 4487
J P Keating et al 2008 Nonlinearity 21 2591
Eddy Ardonne et al 2005 J. Phys. A: Math. Gen. 38 9183
M Garcia-Sucre et al 1994 J. Phys. B: At. Mol. Opt. Phys. 27 4945
Adam Martin and Richard Eskridge 2005 J. Phys. D: Appl. Phys. 38 4168
Neil J Cornish and Shane L Larson 2003 Class. Quantum Grav. 20 S163
M Mikulis et al 2004 J. Phys.: Condens. Matter 16 7909
S K Bhattacharya and Shih-I Chu 1983 J. Phys. B: At. Mol. Phys. 16 L471
B Hampel and J Woisetschläger 2006 Meas. Sci. Technol. 17 2835