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A method to improve the light emission efficiency of Mg-doped GaN

O Gelhausen1,3, M R Phillips1 and E M Goldys2

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Scanning cathodoluminescence (CL) spectroscopy and imaging were used to study the effect of post-growth processing on the CL efficiency of metal–organic vapour phase epitaxy-grown Mg-doped GaN. In this work, two treatments, thermal annealing in high-purity gaseous atmospheres (N2, O2 and H2(5%)/N2) and low-energy electron beam irradiation (LEEBI), have been investigated. Post-growth annealing in a H2/N2 atmosphere followed by LEEBI leads to a significant enhancement of the free electron-to-bound Mg-acceptor (e, Mg) CL emission and a reduction of nonradiative centres involving native defects. The presented results demonstrate that the combination of post-growth annealing in a H2/N2 atmosphere and LEEBI dissociation of Mg–H complex acceptors significantly improves the light emitting efficiency of Mg-doped p-type GaN. Conversely, the samples annealed in a N2 or O2 atmosphere exhibit a reduced (e, Mg) emission after both annealing and LEEBI treatment.


PACS

78.60.Hk Cathodoluminescence, ionoluminescence

61.72.J- Point defects and defect clusters

61.72.uj III–V and II–VI semiconductors

78.66.Fd III-V semiconductors

81.15.Kk Vapor phase epitaxy; growth from vapor phase

81.40.Tv Optical and dielectric properties (related to treatment conditions)

Subjects

Condensed matter: electrical, magnetic and optical

Semiconductors

Surfaces, interfaces and thin films

Condensed matter: structural, mechanical & thermal

Dates

Issue 23 (7 December 2003)

Received 23 May 2003

Published 19 November 2003



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