J de Urquijo et al 2003 J. Phys. D: Appl. Phys. 36 1489 doi:10.1088/0022-3727/36/13/310
J de Urquijo1,2, J L Hernández-Ávila3, E Basurto4 and F Ramírez1
Show affiliationsA pulsed Townsend technique was used to measure the electron drift velocity, the longitudinal diffusion, and the effective ionization coefficients, and the limiting field strength for the binary mixtures of SF6 with Ar and Xe. This paper covered a wide range of the density-reduced electric field strength E/N between 50 and 700 Td (1 Townsend (Td) = 10−17 V cm2). The content of SF6 in the gas mixtures was varied over the range 1–90%. For the SF6–Ar mixture, the electron drift velocities were found to be higher than those for pure SF6, and conversely for the SF6–Xe mixture. The above can be explained in terms of the larger momentum transfer cross-section for electrons in Xe than in Ar. The limiting field strength for the SF6–Xe mixture was found to be higher than that for the SF6–Ar one, but still lower than that for the SF6–N2 mixture.
52.80.Dy Low-field and Townsend discharges
51.20.+d Viscosity, diffusion, and thermal conductivity
51.50.+v Electrical properties (ionization, breakdown, electron and ion mobility, etc.)
Issue 13 (7 July 2003)
Received 27 February 2003
Published 18 June 2003
J de Urquijo et al 2003 J. Phys. D: Appl. Phys. 36 1489
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