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Journal of Physics D: Applied Physics

Electron transport coefficients in SF6 and xenon gas mixtures

Author

D M Xiao , L L Zhu and X G Li

Affiliations

Department of Electrical Engineering, Shanghai Jiaotong University, Shanghai 200030, People's Republic of China

Journal

Journal of Physics D: Applied Physics Create an alert RSS this journal

Issue

Volume 33, Number 23

Citation

D M Xiao et al 2000 J. Phys. D: Appl. Phys. 33 L145

doi: 10.1088/0022-3727/33/23/102


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Abstract

The electron swarm growth processes in SF6-Xe gas mixtures have been studied by a pulsed Townsend method over the range 32.24≤E/N≤564.2 Td (1 Td = 10-21 Vm2), where E is the electric field and N is the gas density of the mixture. The variation patterns as a function of the density-reduced electric field of the effective ionization coefficient bar alpha, electron drift velocity Ve and longitudinal diffusion coefficient DL in SF6-Xe gas mixtures have been given. The dielectric strength of SF6-Xe gas mixtures has also been determined, which varies linearly with SF6 concentration in the gas mixtures.

 
PACS

51.50.+v Electrical properties (ionization, breakdown, electron and ion mobility, etc.)

51.70.+f Optical and dielectric properties

51.10.+y Kinetic and transport theory of gases

51.20.+d Viscosity, diffusion, and thermal conductivity

Subjects

Plasma physics

Dates

Issue 23 (7 December 2000)

Received 13 September 2000



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