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SiGe heterostructures for FET applications

REVIEW ARTICLE

T E Whall and E H C Parker

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REVIEW ARTICLE

The high room-temperature carrier mobilities which have recently been observed for both electrons and holes in Si/SiGe heterostructures and the possibility of further improvements offer the prospect of silicon-based field effect transistors (FETs) with performances matching those of bipolar transistors and III-V modulation-doped FETs. In this article the electrical properties of this semiconductor system and the associated materials challenges are discussed, and some of the more important device applications are reviewed.


PACS

73.40.Lq Other semiconductor-to-semiconductor contacts, p-n junctions, and heterojunctions

85.30.De Semiconductor-device characterization, design, and modeling

72.20.Fr Low-field transport and mobility; piezoresistance

85.30.Tv Field effect devices

Subjects

Condensed matter: electrical, magnetic and optical

Electronics and devices

Semiconductors

Surfaces, interfaces and thin films

Dates

Issue 12 (21 June 1998)

Received 14 November 1997, in final form 16 December 1997


An Erratum for this article has been published in 1999 J. Phys. D: Appl. Phys. 32 1187


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