V Damodara Das and K Seetharama Bhat 1989 J. Phys. D: Appl. Phys. 22 162 doi:10.1088/0022-3727/22/1/023
V Damodara Das and K Seetharama Bhat
Show affiliationsThin films of PbTe of different thicknesses have been prepared on glass substrates at room temperature by vacuum deposition. It is found that the electrical resistivity of the air-exposed films is much higher (by about 2 to 3 orders of magnitude) than that of the as-grown (unexposed) thin films. The electrical resistivity temperature behaviours of both the air-exposed and as-grown (unexposed) thin films of PbTe are different but both show hysteresis behaviour during successive heating-cooling cycles. These observations can be explained by considering that the desorption of absorbed gas molecules (mainly oxygen) and creation of defects at higher temperatures during heating influence the electrical conduction. Further, the time factor involved in gas desorption-adsorption can cause the observed hysteresis in temperature-dependent conduction behaviour. The as-grown (unexposed) thin-film conductivity exhibits the expected reciprocal thickness dependence due to the thickness effect, but the air-exposed film conductivity does not. This can be explained to be due to the complete masking of the thickness effect by the gas adsorption effect in air-exposed film conductivity. The reciprocal thickness dependence observed in the case of unexposed film conductivity has been explained by the 'effective mean free path' model. The low value of the 'grain boundary' mean free path obtained by the analysis points to the fact that in polycrystalline films, grain boundary scattering is extensive and controls the film conductivity.
68.55.-a Thin film structure and morphology
73.61.Le Other inorganic semiconductors
68.55.Ln Defects and impurities: doping, implantation, distribution, concentration, etc.
68.55.A- Nucleation and growth
73.50.Gr Charge carriers: generation, recombination, lifetime, trapping, mean free paths
Issue 1 (14 January 1989)
V Damodara Das and K Seetharama Bhat 1989 J. Phys. D: Appl. Phys. 22 162
P J Allisy-Roberts 2005 J. Radiol. Prot. 25 97
H L Thayer et al 2003 J. Phys. G: Nucl. Part. Phys. 29 2247
Seiji Kawamura et al 2006 Class. Quantum Grav. 23 S125
A Eichenberger et al 2003 Metrologia 40 356
L Kristensen et al 2000 J. Phys. B: At. Mol. Opt. Phys. 33 1103
Bernard Jancewicz and Piotr Brzeski 2005 Eur. J. Phys. 26 617
Wu Xinghui et al 2001 Semicond. Sci. Technol. 16 682
G V Avakov et al 1992 J. Phys. B: At. Mol. Opt. Phys. 25 213
X Tu and C Trägårdh 2002 Meas. Sci. Technol. 13 1079