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Quantitative XPS surface chemical analysis and direct measurement of the temporal response times of glass-bonded NEA GaAs transmission photocathodes

C C Phillips, A E Hughes and W Sibbett

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Semitransparent GaAs films bonded on to glass substrates with a GaxAl1-xAs strain-matching layer have been activated to give negative electron affinity (NEA) characteristics in a commercial UHV apparatus. Quantitative surface analysis of the photocathodes before and after activation show a Cs-O overlayer with a well defined Cs2O stoichiometry and a thickness of approximately 1.3 nm. Measurements of photoelectron energy distribution curves (EDC) from the cathodes confirm the NEA mode of operation, giving very narrow almost wavelength-independent 'thermalised' electron distributions throughout the photosensitivity range. Measurements of the response times of different GaAs NEA cathodes using a special UHV demountable Synchroscan streak camera gave response times as low as approximately 8 ps, suggesting the feasibility of a medium-high temporal resolution streak camera sensitive in the technologically important 1.3-1.55 mu m spectral region.


PACS

73.61.Ey III-V semiconductors

82.80.Pv Electron spectroscopy (x-ray photoelectron (XPS), Auger electron spectroscopy (AES), etc.)

82.65.+r Surface and interface chemistry; heterogeneous catalysis at surfaces

68.37.Xy Scanning Auger microscopy, photoelectron microscopy

Subjects

Semiconductors

Surfaces, interfaces and thin films

Chemical physics and physical chemistry

Dates

Issue 8 (14 August 1984)



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